Liquid Nitrogen Piping - Semiconductor Front End Wafer Growth
The Epitaxy process takes place inside an ultra-high vacuum chamber in order to make materials with high purity and precision. To achieve such low pressures, liquid nitrogen cyroshrouds are used to pump out residual gases. The combination of a modulating inlet phase separator and Triax supply piping ensures sub-cooled, single-phase LN2 circulates through the shroud, and subsequently effective cryopumping. Vacuum jacketing on phase separator, piping, and chamber connections ensure a frost free and efficient connection.